Skip to main navigation Skip to search Skip to main content

Diffusion characteristics study of locally Er-doped noncongruent, Li-deficient Ti:Er:LiNbO3 strip waveguide

  • De Long Zhang*
  • , Bei Chen
  • , Ping Rang Hua
  • , Dao Yin Yu
  • , Edwin Y.B. Pun
  • *Corresponding author for this work
  • Tianjin University
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

Locally Er3+-doped noncongruent, Li-deficient Ti:Er:LiNbO 3 strip waveguide was fabricated with a technological process in sequence of preparation of Li-deficient LiNbO3 substrate using Li-poor vapor transport equilibration (VTE), Er3+, and Ti 4+ diffusion in wet O2. The Li2O content change was evaluated from the measured birefringence. The Ti4+ and Er 3+ profile characteristics in the waveguide were studied by secondary ion mass spectrometry. The results show that the VTE and subsequent Er 3+ diffusion procedures resulted in totally ∼0.8 mol% Li 2O content reduction. The Ti4+ profile follows a sum of two error functions in the width direction and a Gaussian function in the depth direction of waveguide. The Er3+ profile follows also a Gaussian function. At 1130 °C, the Ti4+ surface/depth diffusivity and surface concentration are 8.5 ± 1.3/1.98 ± 0.06 μm 2/h and ∼7 mol%, respectively, and the Er3+ diffusivity and surface concentration are (12.8 ± 0.3) × 10 -2 μm2/h and ∼0.6 mol%, respectively.

Original languageEnglish
Pages (from-to)2924-2930
Number of pages7
JournalJournal of Materials Research
Volume26
Issue number23
DOIs
StatePublished - 14 Dec 2011
Externally publishedYes

Keywords

  • Diffusion
  • Er
  • Ti

Fingerprint

Dive into the research topics of 'Diffusion characteristics study of locally Er-doped noncongruent, Li-deficient Ti:Er:LiNbO3 strip waveguide'. Together they form a unique fingerprint.

Cite this