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Further insights into the Na2WO4-assisted synthesis method for WS2

  • Changyong Lan*
  • , Xinyu Jia
  • , Yiyang Wei
  • , Rui Zhang
  • , Shaofeng Wen
  • , Chun Li
  • , Yi Yin
  • , Johnny C. Ho
  • *Corresponding author for this work
  • University of Electronic Science and Technology of China
  • City University of Hong Kong
  • Kyushu University

Research output: Contribution to journalArticlepeer-review

Abstract

Two-dimensional (2D) materials have become a hot topic in materials science, electronics, optoelectronics, and other fields. However, the practical applications of 2D materials rely heavily on the reliable synthesis of large-area, high-quality materials, which still poses a significant challenge. In this study, we present a detailed investigation into the Na2WO4-assisted synthesis of WS2. Our findings reveal that the substrate temperature and the sequence and duration of introducing S vapor are critical factors in manipulating the morphology of the WS2 products. Monolayer, thick film, and one-dimensional nanostructures can be obtained by varying the substrate temperature and the introduction sequence of S vapor. Furthermore, the introduction sequence and duration of S vapor can significantly impact the monolayer films' optical and electrical properties. Films synthesized with the introduction of S vapor before the evaporation of the W source exhibited strong photoluminescence (PL) emission, with a greater contribution from excitons. In contrast, films synthesized with the introduction of S vapor after the evaporation of the W source showed reduced PL emission, with a greater contribution from trions. Additionally, field effect transistors based on films synthesized with the introduction of S vapor before the evaporation of the W source displayed a larger threshold voltage and higher electron mobility. These findings suggest that the Na2WO4-assisted synthesis method for WS2 is highly controllable and pave the way for utilizing these monolayer WS2 materials for technological applications.

Original languageEnglish
Pages (from-to)6419-6426
Number of pages8
JournalMaterials Advances
Volume4
Issue number23
DOIs
StatePublished - 9 Nov 2023
Externally publishedYes

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