Interface engineering for high-performance top-gated mos2 field-effect transistors

Xuming Zou; Jingli Wang; Chung Hua Chiu; Yun Wu; Xiangheng Xiao; Changzhong Jiang; Wen Wei Wu; Liqiang Mai; Tangsheng Chen; Jinchai Li; Johnny C. Ho; Lei Liao

doi:10.1002/adma.201402008

Interface engineering for high-performance top-gated mos₂ field-effect transistors

Xuming Zou
, Jingli Wang
, Chung Hua Chiu
, Yun Wu
, Xiangheng Xiao
, Changzhong Jiang
, Wen Wei Wu
, Liqiang Mai
, Tangsheng Chen
, Jinchai Li
, Johnny C. Ho^*
, Lei Liao^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

320 Scopus citations

Original language	English
Pages (from-to)	6255-6261
Number of pages	7
Journal	Advanced Materials
Volume	26
Issue number	36
DOIs	https://doi.org/10.1002/adma.201402008
State	Published - Sep 2014
Externally published	Yes

Access to Document

10.1002/adma.201402008

Cite this

@article{b5c4a6c8effc425ea40e7140d66979f9,

title = "Interface engineering for high-performance top-gated mos2 field-effect transistors",

author = "Xuming Zou and Jingli Wang and Chiu, \{Chung Hua\} and Yun Wu and Xiangheng Xiao and Changzhong Jiang and Wu, \{Wen Wei\} and Liqiang Mai and Tangsheng Chen and Jinchai Li and Ho, \{Johnny C.\} and Lei Liao",

year = "2014",

month = sep,

doi = "10.1002/adma.201402008",

language = "英语",

volume = "26",

pages = "6255--6261",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "36",

}

TY - JOUR

T1 - Interface engineering for high-performance top-gated mos2 field-effect transistors

AU - Zou, Xuming

AU - Wang, Jingli

AU - Chiu, Chung Hua

AU - Wu, Yun

AU - Xiao, Xiangheng

AU - Jiang, Changzhong

AU - Wu, Wen Wei

AU - Mai, Liqiang

AU - Chen, Tangsheng

AU - Li, Jinchai

AU - Ho, Johnny C.

AU - Liao, Lei

PY - 2014/9

Y1 - 2014/9

UR - https://www.scopus.com/pages/publications/84941053281

U2 - 10.1002/adma.201402008

DO - 10.1002/adma.201402008

M3 - 文章

AN - SCOPUS:84941053281

SN - 0935-9648

VL - 26

SP - 6255

EP - 6261

JO - Advanced Materials

JF - Advanced Materials

IS - 36

ER -

Interface engineering for high-performance top-gated mos2 field-effect transistors

Access to Document

Other files and links

Cite this

Interface engineering for high-performance top-gated mos₂ field-effect transistors