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Near-stoichiometric Ti:LiNbO3 strip waveguide with varied substrate refractive index in waveguide layer

  • Ministry of Education of the People's Republic of China
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

We report the near-stoichiometric Ti:LiNbO3 strip waveguides fabricated by vapour transport equilibration (VTE) at 1060 °C for 12 h and co-diffusion of 4-8 μm wide, 115-nm thick Ti-strips. Optical studies show that these waveguides are monomode at 1.5 μm and have losses of 1.3 and 1.1 dB/cm for the TM and TE modes, respectively. In the waveguide width/depth direction, the mode field follows a Gauss/Hermite-Gauss profile. A secondary ion mass spectrometry study reveals that the Ti profile follows a sum of two error functions along the width direction and a complementary error function in the depth direction. Micro-Raman analysis shows that the Li-composition in the depth direction also follows a complementary error function. The mean Li/Nb ratio in the waveguide layer is about 0.98. The inhomogeneous Li-composition profile results in a varied substrate index in the guiding layer, and the refractive index profile in the guiding layer is given.

Original languageEnglish
Article number024214
JournalChinese Physics B
Volume19
Issue number2
DOIs
StatePublished - 2010
Externally publishedYes

Keywords

  • 2D refractive index profile
  • Licomposition profile
  • Near-stoichiometric Ti:LiNbO strip waveguide
  • Varied substrate refractive index

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