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Notice of Retraction: Optical-damage-resistant highly Er3+-doped Ti:Er:LiNbO 3 strip waveguide

  • Ministry of Education of the People's Republic of China
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

We report optical-damage-resistant Ti:Er:LiNbO3 strip waveguide with high diffusion-doped surface Er3+ concentration. The waveguide was fabricated starting from a commercial X-cut congruent LiNbO3 plate with a two-step technological process in sequence of simultaneous work of Er3+ diffusion doping and Li-poor vapor transport equilibration treatment, and fabrication of 6-μm-wide Ti-diffused strip waveguide (Z-propagation). The waveguide retains still the LiNbO3 phase and has the waveguiding characteristics similar to the conventional Ti:LiNbO 3 waveguide except with a larger loss due to the imperfection of waveguide. Secondary ion mass spectrometry study shows that the Er3+ diffusion reservoir was exhausted and the profile is the desired Gaussian-type with a surface concentration 1.0 mol%, which is about two times larger than the value of conventional Ti:Er:LiNbO3 amplifier. Further optical characterization shows that the waveguide shows stable 1547 nm small-signal gain under the 980 nm pumping without serious photorefractive effect observed. An unsaturated gain 1.7 dB/cm is obtained for the available coupled pump power of 160 mW.With increased pump power, optimized Er3+ diffusion condition and degraded loss figure, a higher gain is expected.

Original languageEnglish
Article number6668871
Pages (from-to)135-140
Number of pages6
JournalJournal of Lightwave Technology
Volume32
Issue number1
DOIs
StatePublished - 1 Jan 2014
Externally publishedYes

Keywords

  • Photorefractive effect

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