Abstract
We report optical-damage-resistant Ti:Er:LiNbO3 strip waveguide with high diffusion-doped surface Er3+ concentration. The waveguide was fabricated starting from a commercial X-cut congruent LiNbO3 plate with a two-step technological process in sequence of simultaneous work of Er3+ diffusion doping and Li-poor vapor transport equilibration treatment, and fabrication of 6-μm-wide Ti-diffused strip waveguide (Z-propagation). The waveguide retains still the LiNbO3 phase and has the waveguiding characteristics similar to the conventional Ti:LiNbO 3 waveguide except with a larger loss due to the imperfection of waveguide. Secondary ion mass spectrometry study shows that the Er3+ diffusion reservoir was exhausted and the profile is the desired Gaussian-type with a surface concentration 1.0 mol%, which is about two times larger than the value of conventional Ti:Er:LiNbO3 amplifier. Further optical characterization shows that the waveguide shows stable 1547 nm small-signal gain under the 980 nm pumping without serious photorefractive effect observed. An unsaturated gain 1.7 dB/cm is obtained for the available coupled pump power of 160 mW.With increased pump power, optimized Er3+ diffusion condition and degraded loss figure, a higher gain is expected.
| Original language | English |
|---|---|
| Article number | 6668871 |
| Pages (from-to) | 135-140 |
| Number of pages | 6 |
| Journal | Journal of Lightwave Technology |
| Volume | 32 |
| Issue number | 1 |
| DOIs | |
| State | Published - 1 Jan 2014 |
| Externally published | Yes |
Keywords
- Photorefractive effect
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