Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO3 strip waveguides: A way towards new devices

Ping Rang Hua; De Long Zhang; Edwin Yue Bun Pun

doi:10.1109/LPT.2010.2048705

Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO₃ strip waveguides: A way towards new devices

Ping Rang Hua^*
, De Long Zhang
, Edwin Yue Bun Pun

^*Corresponding author for this work

City University of Hong Kong
Tianjin University

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO₃ strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O₂ atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO₃ phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices.

Original language	English
Article number	5458072
Pages (from-to)	1008-1010
Number of pages	3
Journal	IEEE Photonics Technology Letters
Volume	22
Issue number	13
DOIs	https://doi.org/10.1109/LPT.2010.2048705
State	Published - 2010
Externally published	Yes

Keywords

Antiphotorefraction
local Er-Mg-codoping
near-stoichiometric (NS) Ti:Mg:Er:LiNbO waveguide

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10.1109/LPT.2010.2048705

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title = "Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO3 strip waveguides: A way towards new devices",

abstract = "We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O2 atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO3 phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices.",

keywords = "Antiphotorefraction, local Er-Mg-codoping, near-stoichiometric (NS) Ti:Mg:Er:LiNbO waveguide",

author = "Hua, \{Ping Rang\} and Zhang, \{De Long\} and Pun, \{Edwin Yue Bun\}",

year = "2010",

doi = "10.1109/LPT.2010.2048705",

language = "英语",

volume = "22",

pages = "1008--1010",

journal = "IEEE Photonics Technology Letters",

issn = "1041-1135",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "13",

}

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T1 - Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO3 strip waveguides

T2 - A way towards new devices

AU - Hua, Ping Rang

AU - Zhang, De Long

AU - Pun, Edwin Yue Bun

PY - 2010

Y1 - 2010

N2 - We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O2 atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO3 phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices.

AB - We report photorefractive-damage-resistant near-stoichiometric (NS) Ti:Mg:Er:LiNbO3 strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, MgTi prediffusion in wet O2 atmosphere, and post vapor-transport- equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO3 phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices.

KW - Antiphotorefraction

KW - local Er-Mg-codoping

KW - near-stoichiometric (NS) Ti:Mg:Er:LiNbO waveguide

UR - https://www.scopus.com/pages/publications/77953693905

U2 - 10.1109/LPT.2010.2048705

DO - 10.1109/LPT.2010.2048705

M3 - 文章

AN - SCOPUS:77953693905

SN - 1041-1135

VL - 22

SP - 1008

EP - 1010

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

IS - 13

M1 - 5458072

ER -

Photorefractive-damage-resistant locally ErMg-doped near-stoichiometric Ti:Mg:Er:LiNbO₃ strip waveguides: A way towards new devices

Abstract

Keywords

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