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Polarization-insensitive, shallow Ti-diffused near-stoichiometric LiTaO3 strip waveguide for integrated optics

  • Xiao Fei Yang
  • , Zi Bo Zhang
  • , Wan Ying Du
  • , Qun Zhang
  • , Wing Han Wong
  • , Dao Yin Yu
  • , Edwin Yue Bun Pun
  • , De Long Zhang*
  • *Corresponding author for this work
  • Tianjin University
  • University of Toulouse 3
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

We report on a Ti-diffused near-stoichiometric (NS) LiTaO3 strip waveguide fabricated by diffusion of an 8 μm wide, 160 nm thick Ti-strip followed by Li-rich vapor transport equilibration. It is found that the waveguide surface caves in ∼60 nm below the crystal surface. X-ray single-crystal diffraction shows that the indentation is due to Ti-induced lattice contraction. Optical studies show that the waveguide is in an NS composition environment, supports TE and TM single-mode propagation at 1.5 μm wavelength, is polarization insensitive, and has a shallow mode field profile and a loss of 0.2/0.3 dB/cm for the TE/TM mode. Secondary ion mass spectrometry analysis shows that the Ti profile follows a sum of two error functions in the width direction and a Gaussian function in the depth direction of the waveguide. With the optimized fabrication condition, the waveguide is promising for developing an optical-damage-resistant device that requires a shallow mode field profile.

Original languageEnglish
Pages (from-to)2513-2516
Number of pages4
JournalOptics Letters
Volume41
Issue number11
DOIs
StatePublished - 1 Jun 2016
Externally publishedYes

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