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Polymeric optical waveguides using direct ultraviolet photolithography process

  • K. K. Tung
  • , W. H. Wong
  • , E. Y.B. Pun*
  • *Corresponding author for this work
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

Single-mode polymeric channel waveguides were fabricated using simple direct ultraviolet photolithography process. A cross-linkable negative tone epoxy NANO™ SU-8 2000 polymer was used. Once exposed to ultraviolet light through a photomask, the waveguide stripes were obtained upon development. The polymer has many desirable properties, such as high refractive index, good adhesion to substrate, optical transparency in the infrared wavelength region, and high glass transition and high thermal decomposition temperatures. Properties of the optical waveguides were characterized, and there is an excellent agreement between measured data and theory. The values of dn/dT and waveguide birefringence are -1.87 × 10-4 /°C and ∼ 10-4, respectively, and are comparable to those of halogenated acrylate polymers. With an overcladding layer, the propagation losses measured are 0.25 and 0.28 dB/cm at 0.8 μm, 0.62 and 0.77 dB/cm at 1.31 μm, and 1.25 and 1.71 dB/cm at 1.55 μn for TE and TM polarizations, respectively.

Original languageEnglish
Pages (from-to)621-626
Number of pages6
JournalApplied Physics A: Materials Science and Processing
Volume80
Issue number3
DOIs
StatePublished - Feb 2005
Externally publishedYes

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