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Protective AlCrN film for organic photoconductors

  • X. S. Miao
  • , Y. C. Chan*
  • , E. Y.B. Pun
  • *Corresponding author for this work
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

(Al100-xCrx)N (x ≤ 36%) protective film with high transmissivity was deposited onto organic photoconductor (OPC) surface by RF reactive magnetron sputtering. The surface hardness was increased by a factor of 1.5-3.2. The OPC surface protected by (Al100-xCrx)N (x ≤ 71%) film was harder than that by AlN film, and the maximum surface hardness was achieved using ∼47% Cr content. The electrophotographic properties of (Al100-xCrx)N (x ≤ 36%) coated OPC are better than those of either uncoated or AlN-coated OPC. These results confirm the suitability of (Al100-xCrx)N (x ≤ 36%) film to prolong the operating life of OPC.

Original languageEnglish
Pages (from-to)180-183
Number of pages4
JournalThin Solid Films
Volume324
Issue number1-2
DOIs
StatePublished - 1 Jul 1998
Externally publishedYes

Keywords

  • AlCrN film
  • Electrophotographic properties
  • Microhardness
  • Organic photoconductors

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