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RbxK1-xTiOPO4 thin films grown on KTiOPO4 substrates by liquid phase epitaxy

  • L. P. Shi*
  • , E. Y.B. Pun
  • , P. S. Chung
  • *Corresponding author for this work
  • City University of Hong Kong
  • National University of Singapore

Research output: Contribution to journalArticlepeer-review

Abstract

The properties of RbxK1-xTiOPO4 thin films grown on KTiOPO4 substrates are reported. High quality films were obtained using the flux liquid phase epitaxy method, and optical waveguiding was observed in these epitaxial films. X-ray analysis shows that the epitaxial films are single crystals films. Their cell constants are different from those of the substrates. The epitaxy growth rate and other film properties were compared for films grown on different faces. Two different surface morphologies were observed for films grown on (100) faces. The morphologies on (201) and (201) faces were also different. The quality of films grown on the (201) face was better. The reason for a structure inversion for films grown on the z- face is discussed.

Original languageEnglish
Pages (from-to)597-603
Number of pages7
JournalCrystal Research and Technology
Volume32
Issue number4
DOIs
StatePublished - 1997
Externally publishedYes

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