Skip to main navigation Skip to search Skip to main content

The effects of W content on solid-solution strengthening and the critical Hall-Petch grain size in Ni-W alloy

  • Chun Yee Aaron Ong*
  • , Daniel John Blackwood
  • , Yi Li
  • *Corresponding author for this work
  • National University of Singapore
  • CAS - Institute of Metal Research

Research output: Contribution to journalArticlepeer-review

Abstract

Nanocrystalline and amorphous nickel-tungsten alloy with relatively high tungsten contents of up to 34 at.% were produced by electrodeposition. The Hall-Petch relationship and breakdown was studied in this alloy, with grain sizes ranging from 25 nm to fully amorphous. In this higher tungsten content alloy, evidence of solid-solution strengthening was found, which was previously absent in alloys with <13 at.% tungsten. A Hall-Petch trend with a critical grain size of 5 nm was observed, in line with expectations.

Original languageEnglish
Pages (from-to)23-27
Number of pages5
JournalSurface and Coatings Technology
Volume357
DOIs
StatePublished - 15 Jan 2019
Externally publishedYes

Keywords

  • Electrodeposition
  • Hall-Petch effect
  • Nanocrystalline metal
  • Nickel alloys
  • Nickel-tungsten

Fingerprint

Dive into the research topics of 'The effects of W content on solid-solution strengthening and the critical Hall-Petch grain size in Ni-W alloy'. Together they form a unique fingerprint.

Cite this