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Computer simulations of the Stranski-Krastanov growth of heteroepitaxial films with elastic anisotropy

  • P. Liu
  • , Y. W. Zhang*
  • , C. Lu
  • *此作品的通讯作者
  • Agency for Science, Technology and Research, Singapore
  • National University of Singapore

科研成果: 期刊稿件文章同行评审

摘要

A three-dimensional finite element method is developed to simulate the surface morphological evolution during the Stranski-Krastanov heteroepitaxial growth. In the formulation, the surface evolves through surface diffusion driven by the gradient of the surface chemical potential, which includes the elastic strain energy, elastic anisotropy and surface energy. Surface condensation rate is assumed to depend on the difference between the surface chemical potential and the chemical potential of the vapor phase. Our simulations reveal that the self-assembly of quantum dots are strongly dependent on the variation of growth rate and elastic anisotropy strength. With appropriate choice of growth rate and elastic anisotropy strength, a relatively more uniform and regular quantum dot array can be obtained.

源语言英语
页(从-至)375-382
页数8
期刊Surface Science
526
3
DOI
出版状态已出版 - 1 3月 2003
已对外发布

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