Electron beam direct write polymeric optical waveguides

W. H. Wong; E. Y.B. Pun

doi:10.1117/12.447639

Electron beam direct write polymeric optical waveguides

W. H. Wong^*
, E. Y.B. Pun

^*此作品的通讯作者

City University of Hong Kong

科研成果: 期刊稿件 › 会议文章 › 同行评审

摘要

Polymeric single mode optical waveguides based on a new kind of negative tone epoxy novolak resin (ENR) polymer have been fabricated using electron beam direct writing. This polymer has a high refractive index, high sensitivity and high glass transition temperature (Tg). Contrast curves and saturation dosages of the polymer on different substrate materials were obtained, and the sensitivity of ENR is found to be over a hundred times larger than that of Polymethyl-methacrylate (PMMA). For single mode channel waveguides with upper claddings, the propagation losses measured were 0.22dB/cm and 0.48dB/cm at 1330nm and 1550nm for TM mode, and 0.9dB/cm and 1.2dB/cm for TE mode, respectively.

源语言	英语
页（从-至）	100-105
页数	6
期刊	Proceedings of SPIE - The International Society for Optical Engineering
卷	4453
DOI	https://doi.org/10.1117/12.447639
出版状态	已出版 - 2001
已对外发布	是
活动	Materials and Devices for Photonic Circuits II - San Diego, CA, 美国期限: 1 8月 2001 → 2 8月 2001

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title = "Electron beam direct write polymeric optical waveguides",

abstract = "Polymeric single mode optical waveguides based on a new kind of negative tone epoxy novolak resin (ENR) polymer have been fabricated using electron beam direct writing. This polymer has a high refractive index, high sensitivity and high glass transition temperature (Tg). Contrast curves and saturation dosages of the polymer on different substrate materials were obtained, and the sensitivity of ENR is found to be over a hundred times larger than that of Polymethyl-methacrylate (PMMA). For single mode channel waveguides with upper claddings, the propagation losses measured were 0.22dB/cm and 0.48dB/cm at 1330nm and 1550nm for TM mode, and 0.9dB/cm and 1.2dB/cm for TE mode, respectively.",

keywords = "Electron beam lithography, Optical waveguide, Polymer",

author = "Wong, \{W. H.\} and Pun, \{E. Y.B.\}",

year = "2001",

doi = "10.1117/12.447639",

language = "英语",

volume = "4453",

pages = "100--105",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

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publisher = "SPIE",

note = "Materials and Devices for Photonic Circuits II ; Conference date: 01-08-2001 Through 02-08-2001",

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TY - JOUR

T1 - Electron beam direct write polymeric optical waveguides

AU - Wong, W. H.

AU - Pun, E. Y.B.

PY - 2001

Y1 - 2001

N2 - Polymeric single mode optical waveguides based on a new kind of negative tone epoxy novolak resin (ENR) polymer have been fabricated using electron beam direct writing. This polymer has a high refractive index, high sensitivity and high glass transition temperature (Tg). Contrast curves and saturation dosages of the polymer on different substrate materials were obtained, and the sensitivity of ENR is found to be over a hundred times larger than that of Polymethyl-methacrylate (PMMA). For single mode channel waveguides with upper claddings, the propagation losses measured were 0.22dB/cm and 0.48dB/cm at 1330nm and 1550nm for TM mode, and 0.9dB/cm and 1.2dB/cm for TE mode, respectively.

AB - Polymeric single mode optical waveguides based on a new kind of negative tone epoxy novolak resin (ENR) polymer have been fabricated using electron beam direct writing. This polymer has a high refractive index, high sensitivity and high glass transition temperature (Tg). Contrast curves and saturation dosages of the polymer on different substrate materials were obtained, and the sensitivity of ENR is found to be over a hundred times larger than that of Polymethyl-methacrylate (PMMA). For single mode channel waveguides with upper claddings, the propagation losses measured were 0.22dB/cm and 0.48dB/cm at 1330nm and 1550nm for TM mode, and 0.9dB/cm and 1.2dB/cm for TE mode, respectively.

KW - Electron beam lithography

KW - Optical waveguide

KW - Polymer

UR - https://www.scopus.com/pages/publications/0035761746

U2 - 10.1117/12.447639

DO - 10.1117/12.447639

M3 - 会议文章

AN - SCOPUS:0035761746

SN - 0277-786X

VL - 4453

SP - 100

EP - 105

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Materials and Devices for Photonic Circuits II

Y2 - 1 August 2001 through 2 August 2001

ER -

Electron beam direct write polymeric optical waveguides

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