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Enhanced synthesis method to prepare crystalline GaAs nanowires with high growth yield

  • Ning Han*
  • , Fengyun Wang
  • , Alvin T. Hui
  • , Jared J. Hou
  • , Guangcun Shan
  • , Fei Xiu
  • , Tak Fu Hung
  • , Johnny C. Ho
  • *此作品的通讯作者

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Solid-source chemical vapor deposition method is developed for the synthesis of crystalline GaAs NWs with high growth yield using Ni thin film as catalysts on amorphous SiO 2/Si substrates. The NW growth parameters are optimized at the source temperature of 900 °C, substrate temperature of 600 °C and H2 flow rate of 100 sccm for 30 min. The obtained NWs have a narrow distribution of diameters (21.0 ± 4.0 nm), with the length exceeding 10 μm. The NWs are grown along different crystallographic directions with low defect densities observed.

源语言英语
主期刊名Proceedings of the 3rd Asia Symposium on Quality Electronic Design, ASQED 2011
207-210
页数4
DOI
出版状态已出版 - 2011
已对外发布
活动3rd Asia Symposium on Quality Electronic Design, ASQED 2011 - Kuala Lumpur, 马来西亚
期限: 19 7月 201120 7月 2011

出版系列

姓名Proceedings of the 3rd Asia Symposium on Quality Electronic Design, ASQED 2011

会议

会议3rd Asia Symposium on Quality Electronic Design, ASQED 2011
国家/地区马来西亚
Kuala Lumpur
时期19/07/1120/07/11

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