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Polymeric optical waveguides using direct ultraviolet photolithography process

  • K. K. Tung
  • , W. H. Wong
  • , E. Y.B. Pun*
  • *此作品的通讯作者
  • City University of Hong Kong

科研成果: 期刊稿件文章同行评审

摘要

Single-mode polymeric channel waveguides were fabricated using simple direct ultraviolet photolithography process. A cross-linkable negative tone epoxy NANO™ SU-8 2000 polymer was used. Once exposed to ultraviolet light through a photomask, the waveguide stripes were obtained upon development. The polymer has many desirable properties, such as high refractive index, good adhesion to substrate, optical transparency in the infrared wavelength region, and high glass transition and high thermal decomposition temperatures. Properties of the optical waveguides were characterized, and there is an excellent agreement between measured data and theory. The values of dn/dT and waveguide birefringence are -1.87 × 10-4 /°C and ∼ 10-4, respectively, and are comparable to those of halogenated acrylate polymers. With an overcladding layer, the propagation losses measured are 0.25 and 0.28 dB/cm at 0.8 μm, 0.62 and 0.77 dB/cm at 1.31 μm, and 1.25 and 1.71 dB/cm at 1.55 μn for TE and TM polarizations, respectively.

源语言英语
页(从-至)621-626
页数6
期刊Applied Physics A: Materials Science and Processing
80
3
DOI
出版状态已出版 - 2月 2005
已对外发布

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